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表面卤素钝化实现超稳定的金属硫化物高效甲醇光活化
作者:小柯机器人 发布时间:2026/2/13 15:59:59


近日,中国科学技术大学谢毅团队报道了表面卤素钝化实现超稳定的金属硫化物高效甲醇光活化。相关论文于2026年2月10日发表在《美国化学会志》上。

过渡金属硫化物在高附加值化学合成中展现出极具前景的光催化活性,但其在反应过程中存在严重的光腐蚀和快速失活问题。

研究组提出表面卤素(Cl、Br、I)钝化策略以提升光催化剂的稳定性,该策略可构筑抵御化学侵蚀的保护屏障,防止氧化性和还原性表面降解。以典型金属硫化物催化剂CdS为模型,研究组发现引入表面卤素能在持续光辐照下有效抑制硫离子或镉离子的表面泄漏,这与原始CdS中观察到的严重结构破坏形成鲜明对比。

此外,卤素钝化催化剂展现出卓越的光催化效率,这归因于加速电荷转移动力学,从而促进了激子解离和界面电子传输。这些改进使得即使在超低辐照度下,也能实现甲醇的高效活化及杂芳烃的选择性C(sp3)-H甲基化反应,其中Cl钝化CdS的产率高达90%,远超原始CdS的痕量产率。该研究为理解表面卤素钝化在优化光催化光稳定性和电子结构方面的作用提供了基础性见解。

附:英文原文

Title: Surface Halogen Passivation Enables Ultra-Stable Metal Sulfide for Efficient Methanol Photoactivation

Author: Yi Liu, Gang Chen, Lei Li, Hanghao Ying, Hui Wang, Zongpeng Song, Haiou Zhu, Xiaodong Zhang, Yi Xie

Issue&Volume: February 10, 2026

Abstract: Transition metal sulfides exhibit promising photocatalytic activity for high-value-added chemical synthesis; however, they suffer from significant photocorrosion and rapid deactivation during reactions. In this study, we propose a surface halogen (Cl, Br, and I) passivation strategy to improve the stability of photocatalysts, which would provide a protective barrier against chemical attack, preventing oxidative and reductive surface degradation. By taking the typical metal sulfide catalysts of CdS as a representative model, we show that the introduced surface halogen can effectively suppress surface leakage of sulfur or cadmium ions under continuous photoirradiation, in stark contrast to the extensive structural damage observed in pristine CdS. Moreover, the halogen-passivated catalyst showed exceptional photocatalytic efficiency attributable to accelerated charge-transfer kinetics that expedite exciton dissociation and interfacial electron transport. These improvements enable effective methanol activation and selective C(sp3)–H methylation of heteroarenes even at ultralow irradiance, where the Cl-passivated CdS achieves a yield up to 90%, far exceeding the trace yield of pristine CdS. This study provides fundamental insights into the role of surface halogen passivation in optimizing photostability and electronic structure in photocatalysis.

DOI: 10.1021/jacs.5c19863

Source: https://pubs.acs.org/doi/abs/10.1021/jacs.5c19863

期刊信息

JACS:《美国化学会志》,创刊于1879年。隶属于美国化学会,最新IF:16.383
官方网址:https://pubs.acs.org/journal/jacsat
投稿链接:https://acsparagonplus.acs.org/psweb/loginForm?code=1000