近日，南京理工大学高志山团队报道了对高深宽比（HAR）及复合微沟槽三维形貌的傅里叶平面相干扫描干涉测量。相关论文于2026年1月29日发表在《光：科学与应用》杂志上。

对高深宽比（HAR）及复合微沟槽进行无损、精确的表征，是先进微细加工技术的关键需求，但至今仍是重大挑战。传统的相干扫描干涉测量技术虽被广泛采用，但在应用于HAR及复合微结构时，存在信噪比低和横向分辨率受限的问题。

研究组提出傅里叶叠层相干扫描干涉测量技术，这是首种透射式CSI模态，它融合了傅里叶叠层显微术的孔径合成策略与干涉测量的定量相位分辨能力。FP-CSI能够实现稳健的三维形貌重构，具有更高的信噪比和更优的横向分辨率，且无需依赖迭代相位恢复算法。

研究组展示了对一个HAR微沟槽（深度300微米，深宽比30:1）及多种微机电系统器件（深宽比6:1至20:1）的精确测量。FP-CSI实现了高达非相干衍射极限的横向分辨率，并且即使在沟槽底部也能保持这一性能。凭借其高保真度、强鲁棒性和无损测量的特点，FP-CSI为下一代半导体检测、精密制造以及新兴的微光电子系统提供了一个强大的新型计量平台。

附：英文原文

Title: Fourier ptychographic coherence scanning interferometry for 3D morphology of high aspect ratio and composite micro-trenches

Author: Li, Yin, Yuan, Qun, Huo, Xiao, Wang, Shumin, He, Hongtao, Gao, Zhishan

Issue&Volume: 2026-01-29

Abstract: Non-destructive and accurate characterization of high aspect ratio (HAR) and composite micro-trenches is critical for advanced microfabrication but remains a major challenge. Conventional coherence scanning interferometry (CSI), while widely adopted, suffers from low signal-to-noise ratio (SNR) and limited lateral resolution when applied to HAR and composite microstructures. Here, we present Fourier ptychographic coherence scanning interferometry (FP-CSI), the first transmissive CSI modality that integrates the aperture synthesis strategy of Fourier ptychographic microscopy with the quantitative phase-resolved capability of interferometry. FP-CSI enables robust three-dimensional morphology reconstruction with enhanced SNR and improved lateral resolution, without reliance on iterative phase retrieval. We demonstrate accurate measurements of a HAR micro-trench (300μm depth, 30:1 aspect ratio) and micro-electro-mechanical system (MEMS) devices (aspect ratios 6:1–20:1). FP-CSI achieves lateral resolution up to the incoherent diffraction limit and maintains this performance even at trench bottoms. Owing to its fidelity, robustness, and non-destructive operation, FP-CSI provides a powerful new metrology platform for next-generation semiconductor inspection, precision manufacturing, and emerging micro-optoelectronic systems.

DOI: 10.1038/s41377-026-02189-6

Source: https://www.nature.com/articles/s41377-026-02189-6