近日，韩国西江大学Kang, Moon Sung团队研究了单相网状结构中RGB OLED发射层的微米尺度间接光模式。该研究于2025年7月22日发表在《光：科学与应用》杂志上。

以虚拟和增强现实显示为主题的有机发光二极管（OLED）在发射层（EML）中需要微米尺度的红绿蓝（RGB）像素模式。然而，传统的基于蒸发和阴影掩模的图案方法，由于掩模的几何限制，只能产生大于几十微米的图案。

研究组提出了一种间接的溶液处理OLED EML的光图像化方法，该方法可以形成微米尺度的RGB像素图案，而不涉及直接暴露于紫外线辐射或对EML进行苛刻的蚀刻工艺。EML可以通过以下方式进行图案化：1)形成牺牲光刻胶（PR）图案；2)自旋涂覆EML薄膜；3)在低温下通过乙烯基苄基附加主体和掺杂剂交联将EML薄膜转化为单相网络（SPN）结构；4)剥离预先形成的PR图案。

此外，重复该过程三次将形成RGB EML模式。在重复过程中，牺牲PR模式作为底层EML模式的保护层，有效地防止EML模式在后续过程中暴露于溶液中。使用传统的光刻装置，研究组产生了密度超过3000图案/英寸的RGB EML图案集，表明了该方法的潜在应用价值。

附：英文原文

Title: Micrometer-scale indirect photopatterning of RGB OLED emissive layers in single phase network structure

Author: Lee, Seunghan, Ham, Hyobin, Ameen, Shahid, Jhun, Byung Hak, Roh, SeungHwan, Yee, Hyeono, Lim, Chang Hyeok, Heo, Yuchan, Kweon, Hyukmin, Han, Dongheon, Kim, Do Hwan, You, Youngmin, Kim, BongSoo, Kang, Moon Sung

Issue&Volume: 2025-07-22

Abstract: Organic light-emitting diodes (OLEDs) used in virtual and augmented reality displays require micrometer-scale red-green-blue (RGB) pixel patterns in the emissive layer (EML). However, conventional patterning methods based on evaporation and shadow masks can only produce patterns larger than tens of micrometers owing to the geometric constraint of the mask. Herein, an indirect method for photopatterning solution-processed OLED EMLs is proposed, which can be used to form micrometer-scale RGB pixel patterns without involving direct exposure to UV radiation or harsh etching processes on EMLs. EMLs can be patterned by i) forming a sacrificial photoresist (PR) pattern, ii) spin-coating an EML film, iii) converting the EML film into a single-phase network (SPN) structure by crosslinking vinylbenzyl-group-appended hosts and dopants at a low temperature, and iv) stripping the pre-formed PR pattern. Furthermore, repeating the process thrice results in the formation of RGB EML patterns. During the repeated process, the sacrificial PR pattern serves as a protective layer for the underlying EML pattern, effectively preventing the EML pattern from being exposed to solutions in subsequent processes. Using a conventional photolithography setup, we produced sets of RGB EML patterns with densities exceeding 3000 patterns/in., which indicated the potential of the method for industrial use.

DOI: 10.1038/s41377-025-01907-w

Source: https://www.nature.com/articles/s41377-025-01907-w